...high aspect ratios (HARs). Bosch and Cryogenic methods are the best etching candidates of industrial relevance towards the fabrication of these nanostructures. In this paper, we present the fabrication of Silicon (Si) metalenses by the UV-Nanoimprint Lithography method and cryogenic Deep Reactive Ion Etching...
- Forfattere
- Angela Baracu
- Christopher Andrew Dirdal
- Andrei Avram
- Adrian Dinescu
- Raluca Muller
- Geir Uri Jensen
- Paul Conrad Vaagen Thrane
- Hallvard Angelskår
- År
- 2021
- Type
- Vitenskapelig artikkel