Publikasjon
(111)Si thin layers detachment by stress-induced spallation
https://www.sintef.no/publikasjoner/publikasjon/?pubid=CRIStin+1722298
In this work, results of controlled detachment of (111) silicon by stress induced spalling (SIS) process, which is based on a gluing on a metallic stressor layer by an epoxy adhesive on top of a silicon substrate, are presented. It is shown that silicon foils mainly (1 × 1) cm2 with different...