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Oxide Coating of Alumina Nanoporous Structure Using ALD to Produce Highly Porous Spinel

Sammendrag

In this work we show that atomic layer deposition (ALD) stands out as a very promising method for coating nanomaterials and, more specifically, nanoporous materials of technological interest in heterogeneous catalysis. ALD is capable of coating extremely complex shapes with high conformality and high aspect ratios. The current work describes deposition of ZnO and CoO thin films on γ-alumina nanoporous particles with sizes ranging from 20 to 100 µm in diameter, as well on aluminum membrane discs (anodiscs), and converting the surfaces into nanoporous, mechanically more robust spinel phases. We maintain the porosity of the supporting γ-alumina particle, despite the addition of material to the 16 nm pores, by utilizing subsequent reactions between the coated layer and γ-alumina, following the Kirkendall mechanism. The oxide thin film coatings are deposited at 175 and 167°C for ZnO and cobalt oxide, respectively, and thereafter annealed at from 600 to 1000°C for 3 h. This represents a new way to produce highly porous spinel particles and spinel-coated membrane discs.

Kategori

Vitenskapelig artikkel

Oppdragsgiver

  • Research Council of Norway (RCN) / 174893

Språk

Engelsk

Forfatter(e)

  • Protima Rauwel
  • John Walmsley
  • Heidi Berge Frogner
  • Erling Rytter
  • Helmer Fjellvåg
  • Erwan Yann Rauwel
  • Ola Nilsen

Institusjon(er)

  • Universitetet i Oslo
  • Norges teknisk-naturvitenskapelige universitet
  • SINTEF Industri / Materialer og nanoteknologi
  • Equinor

År

2012

Publisert i

Chemical Vapor Deposition

ISSN

0948-1907

Årgang

18

Hefte nr.

10-12

Side(r)

315 - 325

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