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Wet chemically prepared silicon nanowire arrays on low-cost substrates for photovoltaic applications

Sammendrag

Silicon nanowire (SiNW) based solar cells are a promising candidate for third generation solar cells with high efficiency, which will further reduce the cost of the PV modules, making it competitive with conventional energy sources. In this paper the wet chemical etching process for generating silicon nanowires is investigated on different low-cost substrate materials. These nanowires are useful for a radial pn-junction solar cell with core–shell configuration, which allows for using absorber materials with low-carrier lifetime. In this work, wet chemical nanowire etching is applied to edge-defined film-fed growth (EFG) mc-Si wafers, mc-Si wafers made from metallurgical grade Si, multicrystalline (mc-Si) thin films deposited on glass, and thin crystallized films deposited on mc-Si wafers produced from metallurgical grade Si. A proof of concept for using low-cost materials in PV is demonstrated for SiNWs prepared on mc-Si wafer produced from highly doped MG-Si.

Kategori

Vitenskapelig artikkel

Språk

Engelsk

Forfatter(e)

Institusjon(er)

  • Tyskland
  • Storbritannia og Nord-Irland
  • SINTEF Industri / Metallproduksjon og prosessering

År

2013

Publisert i

Physica status solidi. A, Applied research

ISSN

0031-8965

Årgang

210

Hefte nr.

4

Side(r)

728 - 731

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