Al–Al thermocompression bonding suitable for wafer level sealing of MEMS devices has been investigated. This paper presents a comparison of thermocompression bonding of Al films deposited on Si with and without a thermal oxide (SiO2 film). Laminates of diameter 150 mm containing device sealing...
- Authors
- Nishant Malik
- Kari Schjølberg-Henriksen
- Erik Poppe
- Maaike Margrete Visser Taklo
- Terje Finstad
- Year
- 2015
- Type
- Academic article