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Development of a high throughput metalens fabrication process relying on Bosch Deep Reac- tive Ion Etching and UV Nano Imprint Lithorgraphy

Category

Academic lecture

Language

English

Affiliation

  • SINTEF Digital / Microsystems and Nanotechnology

Presented at

META2021

Place

On-Line

Date

20.07.2021 - 23.07.2021

Organizer

Metaconferences.org

Year

2021

View this publication at Cristin