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Towards high-throughput large-area metalens fabrication using UV-nanoimprint lithography and Bosch deep reactive ion etching

Towards high-throughput large-area metalens fabrication using UV-nanoimprint lithography and Bosch deep reactive ion etching

Category
Academic article
Language
English
Affiliation
  • SINTEF Digital / Microsystems and Nanotechnology
  • Unknown
Year
Published in
Optics Express
ISSN
1094-4087
Publisher
Optical Society of America
Volume
28
Issue
10
Page(s)
15542 - 15561