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Towards high-throughput large-area metalens fabrication using UV-nanoimprint lithography and Bosch deep reactive ion etching

Category

Academic article

Language

English

Author(s)

Affiliation

  • SINTEF Digital / Microsystems and Nanotechnology
  • Unknown

Year

2020

Published in

Optics Express

ISSN

1094-4087

Publisher

Optical Society of America

Volume

28

Issue

10

Page(s)

15542 - 15561

View this publication at Cristin