Investigation of the energy pathway for generation of dislocations in silicon at Σ3 grain boundaries with the kinetic Activation-Relaxation Technique
Category
Academic lecture
Client
- Sigma2 / NN9158K
Language
English
Author(s)
- Simen Nut Hansen Eliassen
- Normand Mousseau
- Mickaël Trochet
- Maria Tsoutsouva
- Yanjun Li
- Jesper Friis
- Inga Gudem Ringdalen
Affiliation
- Norwegian University of Science and Technology
- Unknown
- SINTEF Industry / Materials and Nanotechnology
Presented at
Multiscale Materials Modelling
Place
Osaka
Date
28.10.2018 - 02.11.2018