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Hermeticity and Reliability of Al-Al Thermocompression Wafer Bonding

Abstract

Hermeticity and reliability of laminates bonded by Al-Al thermocompression bonding applying different bonding parameters have been investigated. Laminates of diameter 150 mm were realized by bonding a wafer containing membrane structures to wafers with patterned bonding frames. The laminates were bonded applying a bond force of 36 or 60 kN at temperatures ranging from 300 to 400 °C for 15, 30 or 60 minutes. The hermetic properties were estimated by optical measurement of membrane deflection after bonding. Reliability was tested by exposing the laminates to a steady-state life test, a thermal shock test, and a moisture resistance test. Laminates bonded applying a bond force of 60 kN at temperatures of 350 °C or higher resulted in hermetic and reliable bonds. All the dies on the laminates survived steady-state life test and thermal shock test. Leakage was observed in some dies after exposure to moisture resistance test. Measurements of membrane deflection estimated a maximum leak rate below 10-11 mbar×l×s-1 for all tested bonding parameters.

Category

Academic chapter/article/Conference paper

Client

  • Research Council of Norway (RCN) / 210601

Language

English

Author(s)

  • Nishant Malik
  • Erik Poppe
  • Kari Schjølberg-Henriksen
  • Maaike Margrete Visser Taklo
  • Terje Finstad

Affiliation

  • University of Oslo
  • SINTEF Digital / Smart Sensors and Microsystems

Year

2014

Publisher

The Electrochemical Society

Book

2014 ECS and SMEQ Joint International Meeting, October 5, 2014 - October 9, 2014 Semiconductor Wafer Bonding 13: Science, Technology, and Applications

Issue

5

ISBN

978-1-62332-185-7

Page(s)

149 - 160

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