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X-ray Photoelectron Spectroscopy (XPS)

SINTEF Materials and Chemistry, in partnership with the University of Oslo, operate a state-of-the-art spectrometer for X-ray Photoelectron Spectroscopy (XPS). In-situ and/or near in-situ sample treatment combined with advanced surface analysis are performed by scientific personnel having more than 15 years experience in the field.

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X-ray Photoelectron Spectroscopy (XPS). Photo: SINTEF / Werner Juvik

What information we obtain:

  • Qualitative and quantitative elemental analysis of surfaces within a depth of 5-10 nm. Applicable to all elements apart from H.
  • Chemical state identification of elements at surfaces and interfaces.
  • Compositional and chemical state depth profile with Ar+ ion sputtering over several hundreds of nm or via angle resolved XPS (see figures) over the outermost few nanometres.

Sample requirements:

  • Sample dimensions (maximum): height 25 mm, width and length 10 mm
  • Vacuum compatibility, surface free of oil, grease, fingerprints etc
  • Best sample packing: Al foil with the mat side in contact with sample surface

Typical areas of application:

  • Understand/evaluate the corrosion/oxidation of metals.
  • Characterise catalysts and study their degradation.
  • Investigate nanomaterials and nanostructured surfaces .
  • Analyse micro-/ nano-electronics, thin films.
  • Study solar and fuel cell materials.
  • Examine natural & industrial polymers, adhesives, paints, fillers etc.
  • Evaluate the effect of surface treatments and modifications.

Industrial sector that XPS analysis can provide solutions:
All cases where analysis of surfaces and interfaces is important in trouble shouting, process/product quality control and R&D activities. Typical examples are metallurgy, construction, chemistry, energy (gas, oil, renewable), microelectronics, transportation.