X-ray Photoelectron Spectroscopy (XPS)
XPS is a powerful technique for surface analysis, providing detailed information about elemental composition and chemical states within the top few nanometres of a material. From 2026 we will use a Kratos AXIS Supra+ system with monochromatic Al Kα and monochromatic Ag Lα X‐ray sources.
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What is XPS?
XPS uses X-rays to eject photoelectrons from a sample’s surface. By measuring their kinetic energy, we can determine which elements are present and their chemical bonding environments. This makes XPS essential for understanding surface chemistry, contamination, and thin-film properties.
Capabilities:
- Quantitative Surface Composition: Measures which element and how much of each element is present in the top ~10 nm of the surface.
- Chemical State Analysis: Identifies oxidation states and bonding environments.
- Depth Profiling: Uses argon gas cluster sputtering to reveal composition changes below the surface.
- Reflection Electron Energy Loss Spectroscopy (REELS): Provides complementary insights into electronic structure and surface excitations.
- Operando XPS: Four-probe electrical contact and temperature control (−140 °C to +800 °C) are available in house. Additional options are available at synchrotron facilities for real-time studies under working conditions – see more details on Operando XPS.
- Vacuum and inert sample transfer: Ability to move samples from a glove box to the XPS.
Applications:
- Surface contamination and quality control
- Thin-film, coating and interface characterisation
- Semiconductor and oxide analysis
- Polymer and composite surface chemistry
- Catalysis and energy materials research
- Electronic structure studies
Why It Matters
Surface and interface properties often dictate material performance. XPS helps researchers and industry partners correlate surface chemistry with functionality, enabling better design and troubleshooting of advanced materials and devices.
