Cross-Sectional Argon Polishing
Precise sample preparation is essential for high-quality imaging and analysis in electron microscopy. In 2025 we moved to a Technoorg Linda SEMPrep Smart system which uses argon ion milling to produce clean, damage-free cross-sections for advanced characterization techniques.
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What is Argon Polishing?
Argon ion milling gently removes material from the sample surface without introducing mechanical damage. This method is particularly valuable for preparing interfaces, thin films, and fragile structures that require pristine surfaces for SEM, TEM, or XPS analysis.
Capabilities
- Damage-Free Cross-Sections: Ideal for multilayered structures and delicate materials.
- Surface polishing: Removes damage from mechanical preparation to yield pristine surfaces for e.g. EBSD
- Advanced Control: Adjustable ion energy, angle, and milling duration for tailored preparation.
Sample Types:
- Multilayered structures and interfaces.
- Thin films and coatings.
- Battery materials.
- Soft or brittle materials.
- Microelectronic devices.
- Cross sections of metals, ceramics or polymers.
Applications
- High-resolution imaging in SEM and TEM.
- Surface chemistry analysis with XPS.
- Failure analysis of layered devices.
- Preparation of samples for nanoscale characterization.
Why It Matters
Mechanical polishing can introduce artifacts that obscure true material properties. Argon polishing ensures clean, precise cross-sections, enabling accurate imaging and analysis for both research and industrial applications.
