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Investigation of the energy pathway for generation of dislocations in silicon at Σ3 grain boundaries with the kinetic Activation-Relaxation Technique

Category

Conference lecture

Language

English

Author(s)

  • Simen Nut Hansen Eliassen
  • Normand Mousseau
  • Mickaël Trochet
  • Maria Tsoutsouva
  • Yanjun Li
  • Jesper Friis
  • Inga Gudem Ringdalen

Affiliation

  • SINTEF Industry / Materials and Nanotechnology
  • Norwegian University of Science and Technology

Presented at

Multiscale Materials Modelling

Place

Osaka

Date

28.10.2018 - 02.11.2018

Year

2018

View this publication at Norwegian Research Information Repository