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Dry-film resist technology for versatile TSV fabrication for MEMS, tested on blind dummy TSVs

Dry-film resist technology for versatile TSV fabrication for MEMS, tested on blind dummy TSVs

Category
Academic lecture
Client
  • Research Council of Norway (RCN) / 210601
Language
English
Author(s)
Affiliation
  • SINTEF Digital / Microsystems and Nanotechnology
Presented at
DTIP
Place
Cannes
Date
01.04.2014 - 04.04.2014
Organizer
CMP
Year