Abstract
We present mirrors and anti-reflective (AR) surfaces based on micro-structuring of silicon. Compared to dielectric Bragg reflector mirrors and thin film AR-coatings these structures are thinner, result in less material stress, and are compatible with CMOS technology (all silicon). Our surface structures are optimized for the 7-14 μm wavelength range. Such structures have applications within fields of infrared imaging, alcoholmeters, and cooling and anesthesia gas-detectors.