Chemical vapor deposition of silicon from silane: Review of growth mechanisms and modeling/scaleup of fluidized bed reactors

Client

• Research Council of Norway (RCN) / 188026

Author(s)

• Werner Olav Filtvedt
• Arve Holt
• P.A. Ramachandran
• Morten Christian Melaaen

Affiliation

• Institute for Energy Technology
• Washington University, St. Louis
• University of South-Eastern Norway
• SINTEF Industry / Process Technology

Issue

December

DOI