A comparative analysis of structural defect formation in Si+ implanted and then plasma hydrogenated and in H+ implanted crystalline silicon
Category
Academic article
Language
English
Author(s)
- Heidi Nordmark
- Alexander Ulyashin
- John C Walmsley
- Randi Holmestad
Affiliation
- SINTEF
- Norwegian University of Science and Technology
Year
2008Published in
Solid State Phenomena
ISSN
1012-0394
Volume
131-133
Page(s)
309 - 315
View this publication at Norwegian Research Information Repository