Atomic Layer Deposition of Titanium Oxide-Based Films for Semiconductor Applications—Effects of Precursor and Operating Conditions

Client

• Research Council of Norway (RCN) / 296197

Author(s)

• Vladyslav Matkivskyi
• Oskari Leiviska
• Sigurd Wenner
• Hanchen Liu
• Ville Vahanissi
• Hele Savin
• Marisa Di Sabatino
• Maria Gabriella Tranell

Affiliation

• Norwegian University of Science and Technology
• Aalto University
• SINTEF Industry / Materials and Nanotechnology

Issue

16

DOI

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