Tuning of Resist slope for RF MEMS with hard baking parametershas been presented on in ,
Category
Conference lecture
Language
English
Author(s)
- Shimul Chandra Saha
- Håkon Sagberg
- Geir Uri Jensen
- Trond Sæther
Affiliation
- SINTEF
- Norwegian University of Science and Technology
Presented at
19th international Microprocess and Nanotechnology Conference (MNC 2006)
Place
Kanagawa
Date
26.10.2006
Organizer
The Japan Society of Applied Physics/IEEE Electron Device So
Year
2006View this publication at Norwegian Research Information Repository