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Efficiency improvement in nonprime crystalline silicon solar cells by chemical isolation of shunts under front metallization

Abstract

Yield loss due to the breakage and production of nonprime
or off-spec cells in industrially produced crystalline siliconbased solar cells is around 1–2%. Nonprime cells identified based on their electrical properties are rejected after quality inspection.The cells that are rejected can be classified as nonprime for many
reasons, such as poor edge isolation, presence of conductive paths through p-n junctions formed by print paste stains, paste-filled microcracks, inclusions, nonuniform emitter, and nonuniform antireflective coatings. Development of efficient and economically
feasible repair methods for the repowering of nonprime cells will increase the overall yield of the solar cell industry and reduce costs.To isolate severe shunts under front metallization, we developed a two-step chemical etching process to remove front metallization and emitter. Removal of front metallization and emitter yielded
the best isolation of shunts. Shunt isolation and efficiency gain achieved by the chemical etching process has been demonstrated on both mono- and multicrystalline silicon solar cells.

Category

Academic article

Language

English

Author(s)

  • Dilip Chithambaranadhan
  • Vaithianathan Veeramuthu
  • Quang Hong Nguyen
  • Timothy Lommasson
  • Richard Goldberg
  • Tobias Boström

Affiliation

  • SINTEF Narvik
  • UiT The Arctic University of Norway
  • NORCE Norwegian Research Centre AS
  • China
  • Aker Solutions ASA

Year

2015

Published in

IEEE Journal of Photovoltaics

ISSN

2156-3381

Volume

5

Issue

1

Page(s)

206 - 211

View this publication at Norwegian Research Information Repository