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THE MAIN REASONS TO DEVELOP AN IMPROVED CASTING PROCESS FOR SILICON- NEW REQUIREMENTS FOR WORKING ENVIRONMENT, INCREASED POST TAPHOLE YIELD AND PRODUCT QUALITY

THE MAIN REASONS TO DEVELOP AN IMPROVED CASTING PROCESS FOR SILICON- NEW REQUIREMENTS FOR WORKING ENVIRONMENT, INCREASED POST TAPHOLE YIELD AND PRODUCT QUALITY

Category
Academic lecture
Client
  • Research Council of Norway (RCN) / 217373
Language
English
Author(s)
Affiliation
  • Norwegian University of Science and Technology
  • Elkem AS
  • SINTEF Industry / Metal Production and Processing
Presented at
Infacon XIII
Place
Almaty
Date
09.06.2013 - 12.06.2013
Organizer
Abishev Chemistry and Metallurgy Institute
Year