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Nicolas Lietaer

Senior Research Scientist

Nicolas Lietaer

Senior Research Scientist

Nicolas Lietaer
Phone: 932 61 786
Department: Microsystems and Nanotechnology
Office: Oslo

Publications and responsibilities

Publication
https://www.sintef.no/en/publications/publication/?pubid=CRIStin+1678253

SINTEF in collaboration with University of Oslo have been performing R&D activities on 3D detectors with the aim to qualify to be a production site for ITk upgrade. In this context, a 3D detector fabrication run has been completed recently with very promising results. Various sensor geometries w...

Authors Koybasi Ozhan Povoli Marco Kok Angela Summanwar Anand Breivik Lars Hansen Trond Andreas Lietaer Nicolas Røhne Ole Myren Sandaker Heidi
Year 2018
Type Conference lecture and academic presentation
Publication
https://www.sintef.no/en/publications/publication/?pubid=CRIStin+1458745

Metalized micron scale polymer particles have been utilised in anisotropically conductive adhesives for a number of years and more recent work has investigated their selective deposition to provide interconnects. In this work such particles have successfully been deposited onto substrates that inclu...

Authors Sugden Mark W, Tao Junlei Liu Changqing Hutt David A. Whalley David C. Lietaer Nicolas
Year 2016
Type Part of a book/report
Publication
https://www.sintef.no/en/publications/publication/?pubid=CRIStin+1392949

Device encapsulation and packaging often constitutes a substantial part of the fabrication cost of micro electro-mechanical systems (MEMS) transducers and imaging sensor devices. In this paper, we propose a simple and cost-effective wafer-level capping method that utilizes a limited number of highly...

Authors Bleiker Simon J. Taklo Maaike Margrete Visser Lietaer Nicolas Vogl Andreas Bakke Thor Niklaus Frank
Year 2016
Type Journal publication
Publication
https://www.sintef.no/en/publications/publication/?pubid=CRIStin+917490

...3D active edge sensors have advantages such as radiation hardness and edgeless capability. With the use of deep reactive ion etching and wafer bonding, 18.5 by 20.5 mm2 3D detectors with active edges have been successfully fabricated at SINTEF MiNaLab. These sensors are compatible with the ATLAS FE-...

Authors Kok Angela Boscardin M. Dalla Betta G-F. Da Via Cinzia Darbo G. Fleta C. Hansen Thor-Erik Hasi Jasmine Kenney Christopher Lietaer Nicolas Lozano M. Parker Sherwood Pellegrini G. Summanwar Anand
Year 2012
Type Part of a book/report
Publication
https://www.sintef.no/en/publications/publication/?pubid=CRIStin+1272875

Plasma based dry etching is a key process widely used in micro-fabrication today. In this article, we look at the challenges involved in the anisotropic etching of buried SiO2 layers at the bottom of high aspect ratio structures on SOI wa-fers. We present our etch results that show the limitations o...

Year 2011
Type Conference lecture and academic presentation