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Optical, mechanical and electro-optical design of an interferometric test station for massive parallel inspection of MEMS and MOEMS

Optical, mechanical and electro-optical design of an interferometric test station for massive parallel inspection of MEMS and MOEMS

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Sammendrag
The paper presents the optical, mechanical, and electro-optical design of an interferometric inspection system for massive parallel inspection of MicroElectroMechanicalSystems (MEMS) and MicroOptoElectroMechanicalSystems (MOEMS). The basic idea is to adapt a micro-optical probing wafer to the M(O)EMS wafer under test. The probing wafer is exchangeable and contains a micro-optical interferometer array. A low coherent and a laser interferometer array are developed. Two preliminary interferometer designs are presented; a low coherent interferometer array based on a Mirau configuration and a laser interferometer array based on a Twyman-Green configuration. The optical design focuses on the illumination and imaging concept for the interferometer array. The mechanical design concentrates on the scanning system and the integration in a standard test station for micro-fabrication. Models of single channel low coherence and laser interferometers and preliminary measurement results are presented. The smart-pixel approach for massive parallel electro-optical detection and data reduction is discussed.
Språk
Engelsk
Forfatter(e)
Institusjon(er)
  • SINTEF Digital / Smart Sensor Systems
År
2009
Forlag
SPIE - International Society for Optical Engineering
Bok
Optical Measurement Systems for Industrial Inspection VI
Hefte nr.
7389
ISBN
9780819476722