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Three-dimensional analysis of dislocation multiplication during thermal process of grown silicon with different orientations

Sammendrag

We used an advanced 3D model to study the effect of crystal orientation on the dislocation multiplication in single-crystal silicon under accurate control of the cooling history of temperature. The incorporation of the anisotropy effect of the crystal lattice into the model has been explained in detail, and an algorithm for accurate control of the temperature in the furnace has also been presented. This solver can dynamically track the history of dislocation generation for different orientations during thermal processing of single-crystal silicon. Four orientations, [001], [110], [111], and [112], have been examined, and the comparison of dislocation distributions has been provided.

Kategori

Vitenskapelig artikkel

Språk

Engelsk

Forfatter(e)

  • Bing Gao
  • Satoshi Nakano
  • Hirofumi Harada
  • Yoshiji Miyamura
  • Koichi Kakimoto

Institusjon(er)

  • SINTEF Industri / Metallproduksjon og prosessering
  • Kyushu Daigaku

År

2017

Publisert i

Journal of Crystal Growth

ISSN

0022-0248

Forlag

Elsevier

Årgang

474

Side(r)

121 - 129

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