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In the project we have chosen two methods that can potentially provide high volume production, namely chemical solution deposition and in-situ sputtering of PZT thicker than 1µm. Today, it is not clear which method will be successful in realizing high volume deposition of PZT. The best piezoelectric performance is now reported for CSD (chemical solution deposited) PZT thin films grown on Pt electrodes. However, CSD is a novel method for volume thin film deposition. Sputtering on the other hand is a very well known method in the semiconductor industry, but currently the piezoelectric properties are inferior to CSD. Hence, if CSD can be adapted to high volume deposition or the quality of sputtered PZT can be improved, we have a high-volume process.
Published April 22, 2010
Oerlikon Single Wafer Cluster Tool for state of the art PVD, Soft Etch and PECVD applications
Part of CSD equipment from Solar Semi
The research leading to these results has received funding from the European Community's Seventh Framework Programme (FP7/2010-2013) under grant agreement n° 229196