CSD is a very versatile method as it provides excellent stoichiometry control and coverage of large surface areas. In this method a precursor solution of metal organics is deposited by spin-coating and dried/pyrolyzed. The resulting amorphous film is then crystallized after the desired thickness is reached.
A 200 mm wafer deposited with 2 µm PZT
The cluster contains all necessary tools as solution delivery, spin coater, hot plates for pyrolysis, cooling plates and an integrated RTA (rapid thermal annealing) for crystallization.
The cluster has the following specifications
Published January 5, 2018
Automated CSD PZT cluster