CSD of PZT
piezoVolume will develop an automated micro-cluster tool for chemical solution deposition of PZT thin films.

For latest results, please see Project results.

CSD is a very versatile method as it provides excellent stoichiometry control and coverage of large surface areas. In this method a precursor solution of metal organics is deposited by spin-coating and dried/pyrolyzed. The resulting amorphous film is then crystallized after the desired thickness is reached. The state of the art is characterized by excellent quality (e31.f ~ -14 C/m2) on 100 mm wafers with low throughput manual deposition.

SINTEF together with Solar-Semi will use three approaches to enhance the throughput of CSD (chemical solution deposition):

  • Adapt an automated cluster coater available for photoresist coating in the semiconductor industry to CSD of PZT thin films 
  • Increase the wafer size to maximum 200 mm (with ± 5 % thickness uniformity)
  • Throughput aim:4 wafers/h µm

CSD from solar-semiThe application procedures used for CSD are quite similar to what is used in the semiconductor industry for application of photoresist today, which is a proven high throughput process. The difference between the two processes is the number of coatings necessary to achieve the total film thickness.

piezoVolume will develop an automated micro-cluster tool for chemical solution deposition of PZT thin films. Such a cluster will contain all necessary tools as solution delivery, spin coater, hot plate for pyrolysis, cooling plates and an integrated RTA (rapid thermal annealing) for crystallization. The tool will not only be suitable to deposition of PZT, but also any other oxide material like (Ba,Sr)TiO3 for tuneable dielectrics.

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Published April 22, 2010

RTP

CSD

Photos from today's manual CSD

The research leading to these results has received funding from the European Community's Seventh Framework Programme (FP7/2010-2013) under grant agreement n° 229196