SINTEF Materials and Chemistry in partnership with the University of Oslo operate a state-of–the–art spectrometer for X-ray Photoelectron Spectroscopy (XPS). In-situ and/or near in-situ sample treatment combined with advanced surface analysis are performed by scientific personnel having more than 15 years experience in the field.

The principle of the XPS method is x-rays in - electrons out  

What information we obtain:

• Qualitative and quantitative elemental analysis of surfaces within a depth 5-10 nm. Applicable to all elements apart from H
• Chemical state identification of surfaces and interfaces
• Compositional and chemical state depth profile with Ar ion sputtering over several hundreds of nm or via angle resolved XPS (see figures) over the outermost few nanometers

Sample requirements:

• Sample dimensions (maximum): height 4mm (thicker samples possible), width 50 mm, length 100 mm
• Vacuum compatibility, surface free of oil, grease, fingerprints etc
• Best sample packing: Al foil with the mat side in contact with sample surface

Typical areas of application:

• Corrosion/oxidation of metals
• Catalysis
• Nanomaterials, nanoparticles, nanowires, nanostructured surfaces
• Electronics, micro-nano-electronics, thin films
• Solar/Fuel cell structures
• Natural & industrial polymers, adhesives, paints, fillers etc
• Surface treatments and modifications

Industrial sector that XPS analysis can provide solutions:
All cases where analysis of surfaces and interfaces is important in trouble shouting, process/product quality control and R&D activities. Typical examples are Metallurgy, Construction, Chemical, Energy (gas, oil, renewable), Transportation, Public Sector.